Advancement of Laser-Assisted and Roller-Based Nanoimprinting Technology
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Publisher
Springer Berlin Heidelberg
Link
http://link.springer.com/content/pdf/10.1007/978-3-642-18293-8_12
Reference43 articles.
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2. Chou S. Y., P. R. Krauss, and P. J. Renstrom, (1996), “Nanoimprint lithography,” J. Vac. Sci. Technol., B 14(6): 4129–4133
3. Chou S. Y., P. R. Krauss, and P. J. Renstrom, (1996), “Imprint lithography with 25-nanometer resolution,” Science, 272(5258): 85–87
4. Chou S. Y., and P. R. Krauss, (1997), “Imprint Lithography with Sub-10 nm Feature Size and High Throughput,” Microelect. Eng., 35(1–4): 237–240
5. Guo L., P. R. Krauss, and S. Y. Chou, (1997), Nanoscale silicon field effect transistors fabricated using imprint Lithography, Appl. Phys. Lett., 71(13): 1881–1883
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