Synthesis and characterization of methacrylate matrix resin bearing o-nitrobenzyl group
Author:
Publisher
Springer Science and Business Media LLC
Subject
Metals and Alloys,General Engineering
Link
http://link.springer.com/content/pdf/10.1007/s11771-015-2869-z.pdf
Reference19 articles.
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3. DIAKOUMAKOS C D, RAPTIS I, TSEREPI A, ARGITIS P. Free-radical synthesis of narrow polydispersed 2-hydroxyethyl methacrylate-based tetrapolymers for dilute aqueous base developable negative photoresists [J]. Polymer, 2002, 43(4): 1103–1113.
4. CHAE K H, SUN G J, KANG J K, KIM T H. A water-developable negative photoresist based on the photocrosslinking of N-phenylamide groups with reduced environmental impact [J]. Journal of Applied Polymer Science, 2002, 86(5): 1172–1180.
5. KIM J B, JANG, J H, KO J S, CHOI, J H, LEE K K. Environmentally friendly negative resists based on acid-catalyzed acetalization for 193-nm lithograph [J]. Macromolecular Rapid Communications, 2003, 24(15): 879–882.
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