A water-developable negative photoresist based on the photocrosslinking ofN-phenylamide groups with reduced environmental impact
Author:
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry
Reference30 articles.
1. A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist
2. Photoresists with Reduced Environmental Impact: Water-Soluble Resists Based on Photo-Cross-Linking of a Sugar-Containing Polymethacrylate
3. Design of photoresists with reduced environmental impact. II. Water-soluble resists based on photocrosslinking of poly(2-isopropenyl-2-oxazoline)
4. Design of Photoresists with Reduced Environmental Impact. 1. Water-Soluble Resists Based on Photo-Cross-Linking of Poly(vinyl alcohol)
5. A new water-soluble photoresist used a polymeric azide compound as a photosensitizer.
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