Evaluation of Nano-Patterning Performance of Water-Soluble Material for Photoresist Using Sugar Chain
Author:
Affiliation:
1. Department of Mechanical Systems Engineering, Toyama Prefectural University
2. Gunei Chemical Industry
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/33/4/33_445/_pdf
Reference9 articles.
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3. 3. J. M. Havard, M. Yoshida, D. Pasini, N. Vladimirov, J. M. J. Frechet, D. R. Medeiros, K. Patterson, S. Yamada, C. G. Willson, and J. D. Byers, J. Appl. Polym. Sci. Part A: Polym. Chem., 37 (1999) 1225.
4. 4. J. M. Havard, S.-Y. Shim, and J. M. J. Frechet, Chem. Mater., 11 (1999) 719.
5. 5. K. Kojima, M. Ito, H. Morishita, and N. Hayashi, Chem. Mater., 10 (1998) 3429.
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