Effects of Ar ion assisted deposition on the optical and electrical characteristics of electron-beam-evaporated amorphous Si films-Reference-Cited by-同舟云学术

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Effects of Ar ion assisted deposition on the optical and electrical characteristics of electron-beam-evaporated amorphous Si films

Published:2006-09 Issue:5 Volume:2 Page:358-360
ISSN:1673-1905
Container-title:Optoelectronics Letters
language:en
Short-container-title:Optoelectr. Lett.

Author:

Shu Xiong-wen,Xu Chen,Tian Zeng-xia,Luo Dan,Shen Guang-di

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/BF03033523.pdf

Reference14 articles.

1. philip Martin,IEEE transactions on plasma science,18 (1990), 855.

2. S. Mohan, and M. Ghanashyam Krishna,Vacuum,46 (1995), 645.

3. N. A. G. Ahmed,Surface and coatings technology,71(1995), 82.

4. A. Bittar, H. J. Trodahl, and N. T. Kemp,Appl. Phys. Lett.,78 (2001), 619.

5. R. B. Bergmann, C. Zaczek, and N. Jensen,Appl. Phys. Lett.,72(1998), 2996.

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