Atomic layer deposition of self-assembled aluminum nanoparticles using dimethylethylamine alane as precursor and trimethylaluminum as an initiator
Author:
Publisher
Springer Science and Business Media LLC
Subject
Condensed Matter Physics,General Materials Science,Modeling and Simulation,General Chemistry,Atomic and Molecular Physics, and Optics,Bioengineering
Link
https://link.springer.com/content/pdf/10.1007/s11051-022-05618-w.pdf
Reference37 articles.
1. Puurunen RL (2005) Surface chemistry of atomic layer deposition: a case study for the trimethylaluminum/water process. J Appl Phys 97:1–52. https://doi.org/10.1063/1.1940727
2. Hirama K, Sato H, Harada Y et al (2012) Thermally stable operation of h-terminated diamond FETs by NO 2 adsorption and Al 2O 3 passivation. IEEE Electron Device Lett 33:1111–1113. https://doi.org/10.1109/LED.2012.2200230
3. George SM (2010) Atomic layer deposition: an overview. Chem Rev 110:111–131. https://doi.org/10.1021/cr900056b
4. Sasaki S, Tateno K, Zhang G et al (2015) Self-aligned gate-all-around InAs/InP core-shell nanowire field-effect transistors In: Japanese Journal of Applied Physics. Japan Soc Appl Phys 54(4S):04DN04
5. Irie H, Harada Y, Sugiyama H, Akazaki T (2014) Josephson coupling through one-dimensional ballistic channel in semiconductor-superconductor hybrid quantum point contacts. Phys Rev B Condens Matter Mater Phys 89:165415. https://doi.org/10.1103/PhysRevB.89.165415
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Characterization of alane (AlH3) thin films grown by atomic layer deposition for hydrogen storage applications;Applied Surface Science;2024-11
2. Morphology and Elemental Characterization of Alane Thin Film 2d-Material Grown by Atomic Layer Deposition for Hydrogen Storage and Energy Applications;2024
3. Multiscale CFD Modeling of Area-Selective Atomic Layer Deposition: Application to Reactor Design and Operating Condition Calculation;Coatings;2023-03-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3