Characterization of alane (AlH3) thin films grown by atomic layer deposition for hydrogen storage applications-Reference-Cited by-同舟云学术

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Characterization of alane (AlH3) thin films grown by atomic layer deposition for hydrogen storage applications

Published:2024-11 Issue: Volume:672 Page:160840
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Okasha Sameh^ORCID,Almeida Trevor P.^ORCID

Publisher

Elsevier BV

Reference43 articles.

1. Materials for hydrogen-based energy storage – past, recent progress and future outlook;Hirscher;J. Alloy. Compd.,2020

2. Formation and decomposition of AlH3 in the aluminum-hydrogen system;Saitoh;Appl. Phys. Lett.,2008

3. Formation and crystal growth process of AlH3 in Al–H system;Saitoh;J. Alloy. Compd.,2010

4. Alkali metal hydride doping of α-AlH3 for enhanced H2 desorption kinetics;Sandrock;J. Alloy. Compd.,2006

5. Dehydriding reaction of AlH3: in situ microscopic observations combined with thermal and surface analyses;Ikeda;Nanotechnology,2009

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