Mass spectrometric study of NF3 plasma etching of silicon-Reference-Cited by-同舟云学术

Mass spectrometric study of NF3 plasma etching of silicon

Published:1990-12 Issue:4 Volume:10 Page:571-587
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Perrin Jerome,M�ot Jacques,Si�fert Jean-Marie,Schmitt Jacques

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF01447265.pdf

Reference21 articles.

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2. K. Kausche, M. Möller, and R. Plättner,Proc. 5th European Community Photovoltaic Solar Energy Conf., Athens 1983, W. Palz, ed., Reidel, Dordrecht (1983), p.707.

3. R. Primig and K. Rosan,Vacuum 36, 75 (1986).

4. J. P. M. Schmitt, J. Méot, P. Roubeau, and P. Parrens,Proc. 8th European Community Photovoltaic Solar Energy Conf., Florence 1983, I. Solomon, B. Equer, and P. Helm, eds., Kluwer Academic Publ., Dordrecht (1988), p.964.

5. C. J. Mogab, A. C. Adams, and D. L. Flamm,J. Appl Phys. 49, 3796 (1979).

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