Plasma cleaning in an a-Si:H deposition chamber
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference21 articles.
1. Amorphous Semiconductor, Technologies and Devices,1982
2. Recent applied developments in the amorphous silicon field
3. Plasma preparations of amorphous silicon films
4. Preparation of glow discharge amorphous silicon for passivation layers
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Black silicon method: X. A review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next generation equipment;Journal of Micromechanics and Microengineering;2009-02-02
2. Plasma Cleaning and Etching Using Quartz Bell Jar withSnO2Transparent Thin-Film Heater inCHF3–SiO2Mocrowave Etching System;Japanese Journal of Applied Physics;1994-06-15
3. Plasma Cleaning by Use of Hollow-Cathode Discharge in a CHF3-SiO2Dry-Etching System;Japanese Journal of Applied Physics;1992-05-15
4. Mass spectrometric study of NF3 plasma etching of silicon;Plasma Chemistry and Plasma Processing;1990-12
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