1. M. Krishnan, J.W. Nalaskowski, and L.M. Cook, Chem. Rev. 110, 178 (2010).
2. Y. Gu, S. Chang, G. Zhang, K. Kirmse, D. Rogers, L. Olsen, and J. Lewellen, Proc. SPIE 6152, 1 (2006).
3. C.-P. Chen, B. Huang, W. Lee, W.-J. Chung, and H.T. Hou, Proc. SPIE 4344, 274 (2001).
4. G.-B. Wang, E.-H. Lin, H.-S. You, M.-W. Lee, F.-K. Hsiao, and C.-W. Lai, IEEE 8469-5/04, 178 (2004).
5. A. Chen, R.-.S. Guo, Y.L. Chou, C.L. Lin, J. Dun, and S.A. Wu, IEEE 5403-6/99, 229 (1999).