Heteroepitaxial Growth of Germanium-on-Silicon Using Ultrahigh-Vacuum Chemical Vapor Deposition with RF Plasma Enhancement-Reference-Cited by-同舟云学术

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Heteroepitaxial Growth of Germanium-on-Silicon Using Ultrahigh-Vacuum Chemical Vapor Deposition with RF Plasma Enhancement

Published:2018-05-03 Issue:8 Volume:47 Page:4561-4570
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:Journal of Elec Materi

Author:

Alharthi Bader,Grant Joshua M.,Dou Wei,Grant Perry C.,Mosleh Aboozar,Du Wei,Mortazavi Mansour,Li Baohua,Naseem Hameed,Yu Shui-Qing

Funder

Air Force Office of Scientific Research

National Aeronautics and Space Administration Established Program to Stimulate Competitive Research

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/article/10.1007/s11664-018-6315-5/fulltext.html

Reference25 articles.

1. M. Moravej and R. Hicks, J. Chem. Vap. Depos. 11, 469 (2005).

2. C.G. Littlejohns, A.Z. Khokhar, D.J. Thomson, Y. Hu, L. Basset, S.A. Reynolds, G.Z. Mashanovich, G.T. Reed, and F.Y. Gardes, IEEE Photonics J. 7, 1 (2015).

3. R. Soref, Nat. Photonics 4, 495 (2010).

4. M. El Kurdi, G. Fishman, S. Sauvage, and P. Boucaud, J. Appl. Phys. 107, 013710 (2010).

5. M.J. Süess, R. Geiger, R.A. Minamisawa, G. Schiefler, J. Frigerio, D. Chrastina, G. Isella, R. Spolenak, J. Faist, and H. Sigg, Nat. Photonics 7, 466 (2013).

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