Study of low-frequency relaxation phenomena in thin-film capacitors-Reference-Cited by-同舟云学术

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Study of low-frequency relaxation phenomena in thin-film capacitors

Published:1976-02 Issue:6 Volume:31 Page:401-430
ISSN:0003-6994
Container-title:Applied Scientific Research
language:en
Short-container-title:Applied Scientific Research

Author:

Wilde W.,Mey G.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering,Physical and Theoretical Chemistry,General Physics and Astronomy,General Chemical Engineering

Link

http://link.springer.com/content/pdf/10.1007/BF00426357.pdf

Reference49 articles.

1. Keonjian, E., Microelectronics, McGrawHill, New York, 1963, pp. 176?181.

2. Holland, L., Vacuum deposition of thin films. Chapman, London, 1966, p. 303.

3. Burvenich, X., Galvano, 414 (1971) 749.

4. Burvenich, X., Galvano, 415 (1971) 851.

5. Chopra, K., Thin film phenomena, McGraw-Hill, New York, 1969, pp. 91?103.

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Interfacial properties of metal-silicon oxide-metal structures in relation to the non-stoichiometry of a thin film dielectric;Thin Solid Films;1980-04

2. A thin-film transistor with polytetrafluoroethylene as insulator;IEE Proceedings I Solid State and Electron Devices;1980

3. Measurement of the complex permittivity of thin films in the very low frequency range;Journal of Physics E: Scientific Instruments;1979-03

4. Capacitors;Microelectronic Packaging;1979

5. Dielectric relaxation in vitreous metaphosphates at medium temperatures;Journal of Non-Crystalline Solids;1978-11

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