Interfacial properties of metal-silicon oxide-metal structures in relation to the non-stoichiometry of a thin film dielectric
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference18 articles.
1. Dielectric Properties and DC Conductivity of Vacuum-Deposited SiO Films
2. Dielectric properties of thin films of aluminium oxide and silicon oxide
3. Sur les propriétés diélectriques en courant alternatif de structures or-monoxyde de silicium-or
4. The electrical properties of silicon monoxide
5. ac properties of biased MIM structures
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1. The effect of thickness and temperature on dielectric properties of lutetium oxide thin films grown by electron-beam deposition on quartz;Thin Solid Films;2012-11
2. Dielectric relaxation of Al/Lu2O3/Al thin film structures from 10μHz to 10MHz;Journal of Non-Crystalline Solids;2007-12
3. Nucleation, growth and characterization of thin solid films;Progress in Crystal Growth and Characterization;1987-01
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