Dielectric relaxation of Al/Lu2O3/Al thin film structures from 10μHz to 10MHz
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference22 articles.
1. Electrical Characteristics for Lu[sub 2]O[sub 3] Thin Films Fabricated by E-Beam Deposition Method
2. Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectrics and other oxide materials
3. Effect of heat-treatment temperature on the luminescent properties of Lu2O3:Eu film prepared by Pechini sol–gel method
4. Cerium dioxide buffer layers at low temperature by atomic layer deposition
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