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2. Hockett, R.S., Baumann, S.M., and Schemmel, E., Extended Abstracts, Volume 88–2, The Electrochemical Society, Abstract 423, p. 621 (1988); full paper published in Diagnostic Techniques for Semiconductor Materials and Devices, edited by T. J. Shaffner and D. K. Schroder, ECS Proceedings Vol. 88–20, The Electrochemical Society, Pennington, NJ, p. 113 (1988).
3. Huber, A., Rath, H.J., and Eichinger, P., Ibid., Electrochem. Soc., Abstract 422, p. 619 (1989); also published in Diagnostic Techniques for Semiconductor Materials and Devices, edited by T. J. Shaffner and D. K. Schroder, ECS Proceedings Vol. 88–20, The Electrochemical Society, Pennington, NJ, p. 109 (1988).
4. Eichinger, P., Rath, H.J., and Schwenke, H., Semiconductor Fabrication: Technology and Metrology, ASTM STP 990, Dinesh C. Gupta, editor, American Society for Testing and Materials, 305 (1989).
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