Detection of metallic trace impurities on Si(100) surfaces with total reflection X-ray fluorescence (TXRF)-Reference-Cited by-同舟云学术

Detection of metallic trace impurities on Si(100) surfaces with total reflection X-ray fluorescence (TXRF)

Published:1989-01 Issue:4-5 Volume:333 Page:586-589
ISSN:0016-1152
Container-title:Fresenius' Zeitschrift für analytische Chemie
language:en
Short-container-title:Z. Anal. Chem.

Author:

Penka V.,Hub W.

Publisher

Springer Science and Business Media LLC

Subject

Clinical Biochemistry,General Materials Science,General Medicine,Analytical Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF00572381.pdf

Reference12 articles.

1. Eichinger P, Rath H-J, Schwenke H (1988) Application of total reflection X-ray fluorescence analysis for metallic trace impurities on silicon wafer surfaces. In: Gupta C (ed) Semiconductor fabrication: technology and metrology. ASTM STP 990, American Society for Testing and Materials

2. Iida A, Sakurai K, Yoshinaga A, Goshi Y (1986) Nucl Instrum Methods A246:736–738

3. Knoth J, Schwenke H, Weisbrod U (1989) Spectrochim Acta, to be published

4. Penka V, Hub W (1989) Spectrochim Acta, to be published

5. Compton A, Allison S (1935) X-Rays in theory and experiment. Van Nostrand, Princeton

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