Reactive Gas Glow Discharges
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Publisher
Springer US
Link
http://link.springer.com/content/pdf/10.1007/978-1-4684-5967-8_5.pdf
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3. J.W. Coburn and M. Chen, Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density, J. Appl. Phys. 51: 3134 (1980).
4. R. d’Agostino, F. Cramarossa, S. De Benedictus and G. Ferraro, Spectroscopic diagnostics of CF4–02 plasmas during Si and SiO2 etching processes, J. Appl. Pis. 52: 1259 (1981).
5. V.M. Donnelly, D.L. Flamm, W.C. Dautremont-Smith and D.J. Werder, Anisotropic etching of Si02 in low frequency CF4/O2 and NF3/Ar plasmas, J. Appl. Phys. 55: 242 (1984).
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