Author:
Bonnaud Olivier,Mohammed-Brahim Tayeb,Ast Dieter G.
Reference130 articles.
1. Springer Verlag, Proceedings in Physics;M Aucouturier,1989
2. Scitec Publications;S McKernan,1994
3. T. Noma, T. Yonehara and H. Kumomi, “Crystal forms by solid-state recrystallization of amorphous Si films on SiO2,” Appl. Phys. Lett., 59, 653 (1991).
4. P. Joubert, B. Loisel, Y. Chouan, L. Haji, “The effect of low pressure on the structure of LPCVD polycrystalline silicon films,” J. Electrochem. Soc., 134 (10), 2541, (1987).
5. P. Joubert, B. Loisel, “Crystal grain nucleation in amorphous silicon,” Appl. Phys. Let., 84, 5383 (1988).
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