Sputtering of Thin Films in an Ion Microprobe-Reference-Cited by-同舟云学术

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Sputtering of Thin Films in an Ion Microprobe

Published:1976 Issue: Volume: Page:659-664
ISSN:
Container-title:Ion Beam Surface Layer Analysis
language:
Short-container-title:

Author:

Hofer W. O.,Liebl H.

Publisher

Springer US

Link

http://link.springer.com/content/pdf/10.1007/978-1-4615-8879-5_13.pdf

Reference7 articles.

1. A. Benninghoven, Z. Angew. Physik, 27 (1969) 51

2. A.J. Summers, N.J. Freeman and N.R. Daly, J. Appl.Phys. 42 (1971) 4774

3. H. Liebl, Int.J.Mass Spectr.Ion Phys. 6 (1971) 401

4. W.O. Hofer, H. Liebl, G. Roos and G. Staudenmaier, Int. J. Mass Spectr. Ion Phys., in press

5. W.O. Hofer and H. Liebl, Applied Physics, in press

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1. Beryllium as the plasma-facing material in fusion energy systems—experiments, evaluation, and comparison with alternative materials;Fusion Engineering and Design;1997-11

2. Sputtering yields of nickel and chromium;Applied Physics A Solids and Surfaces;1989-12

3. On the chemical sputtering of oxygen-exposed molybdenum;Applied Physics A Solids and Surfaces;1986-08

4. Effects of monolayer coverages on substrate sputtering yields;Radiation Effects;1985-01

5. Synergism in materials erosion due to multispecies impact;Radiation Effects;1985-01

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