Effects of monolayer coverages on substrate sputtering yields-Reference-Cited by-同舟云学术

Effects of monolayer coverages on substrate sputtering yields

Published:1985-01 Issue:1-2 Volume:89 Page:113-127
ISSN:0033-7579
Container-title:Radiation Effects
language:en
Short-container-title:Radiation Effects

Author:

Gruen D. M.,Krauss A. R.,Pellin M. J.

Publisher

Informa UK Limited

Subject

General Engineering

Link

http://www.tandfonline.com/doi/pdf/10.1080/00337578508220698

Reference38 articles.

1. Materials for impurity control

2. Cecchi, J. L. and TFTR Group. 1984. Proc. Sixth Int. Conf. on Plasma Surface Interactions in Controlled Fusion Devices, held at Nagoya University. May1984, Nagoya, Japan.

3. Surface segregation in binary alloy first wall candidate materials

4. Modification of alloy surface composition by segregation processes as a means of impurity control in fusion devices

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