Particulate Surface Contamination and Device Failures-Reference-Cited by-同舟云学术

Particulate Surface Contamination and Device Failures

Published:1987 Issue: Volume: Page:123-148
ISSN:
Container-title:Treatise on Clean Surface Technology
language:
Short-container-title:

Author:

Monkowski Joseph R.

Publisher

Springer US

Link

http://link.springer.com/content/pdf/10.1007/978-1-4684-9126-5_6.pdf

Reference76 articles.

1. T. G. O’Neill, Clean room efficiency: A combination of design and operation, Semiconductor International 3(11), 49–62 (1980).

2. VLSI Facilities Overview, ICE Corporation Publication 16–1781-02, Figure 7337C (1985).

3. D. LaFeuille, D. Roche, and E. M. Juleff, Purity of chemicals for semiconductor processing, Solid State Technol.18(1), 43–48 (1975).

4. E. M. Juleff, W. J. McCleod, E. A. Hulse, and S. Fawcett, Advances in contamination control of processing chemicals in VLSI, Solid State Technol. 25(9), 82–86 (1982).

5. A. Weiss, Particulate filtration of chemicals, gases, and photoresist, Semiconductor International 5(7), 55–64(1982).

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