Subnanometer-accuracy z-position monitor mask for optical lithography
Author:
Publisher
Springer Science and Business Media LLC
Subject
Atomic and Molecular Physics, and Optics
Link
http://link.springer.com/content/pdf/10.1007/s10043-010-0090-8.pdf
Reference10 articles.
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1. Computational Study of the Focus Monitoring with Sub-Wavelength Grating in Optical Lithography;Journal of Photopolymer Science and Technology;2020-07-01
2. Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography;Optik;2014-11
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