A Novel Technique for Measuring Defocus with Phase Shift Gratings on a Photomask
Author:
Publisher
Springer Science and Business Media LLC
Subject
Atomic and Molecular Physics, and Optics
Link
http://link.springer.com/content/pdf/10.1007/s10043-001-0184-4.pdf
Reference7 articles.
1. T. A. Brunner, A. L. Martin, R. M. Martino, C. P. Ausschnitt, T. H. Newman and M. S. Hibbs: Proc. SPIE 2197 (1994) 541.
2. H. Ohtsuka, T. Onodera, K. Kuwahara and T. Taguchi: Proc. SPIE 1674 (1992) 53.
3. M. Maenhoudt, S. Verhaegen, K. Ronse, P. Zandbergen and E. Muzio: Proc. SPIE 4000 (2000) 373.
4. G. M. Pugh, B. DeWitt, C. Sager and P. Reynolds: Proc. SPIE 2440 (1995) 690.
5. H. Nomura and T. Sato: Appl. Opt. 38 (1999) 2800.
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