Computational Study of the Focus Monitoring with Sub-Wavelength Grating in Optical Lithography-Reference-Cited by-同舟云学术

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Computational Study of the Focus Monitoring with Sub-Wavelength Grating in Optical Lithography

Published:2020-07-01 Issue:1 Volume:33 Page:57-62
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Yuito Takashi¹,Sasago Masaru¹,Hirai Yoshihiko¹

Affiliation:

1. Department of Physics and Electronics, Graduate School of Engineering, Osaka Prefecture University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/33/1/33_57/_pdf

Reference15 articles.

1. 1. T. A. Brunner, A. L. Martin, R. M. Martino, C. P. Ausschnitt, and T. H. Newman, Proc. SPIE, 2197 (1994) 541.

2. 2. T. A. Brunner, M. S. Hibbs, B. B. Peck, and C. A. Spence, US patent No. 5,300,786 (1994)

3. 3. H. Watanabe, and Y. Okuda, J. Vac. Sci. Technol. B, 15 (1997) 2417.

4. 4. H. Nomura, Proc. SPIE, 4346 (2001) 25.

5. 5. S. Nakao, S. Maejima, N. Tamada, S. Yamashita, A. Ueno, J. Miyazaki, A. Tokui, K. Tsujita, and I. Arimoto, Proc. SPIE, 4691 (2002) 765.

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