RF sputtering: A viable tool for MEMS fabrication

Author:

Chandra Sudhir,Bhatt Vivekanand,Singh Ravindra

Publisher

Springer Science and Business Media LLC

Subject

Multidisciplinary

Reference16 articles.

1. Beadle W E, Tsai J C C, Plummer R D 1985 Quick reference manual for silicon integrated circuit technology. (John Weiley & Sons Inc.) 5–8

2. Bhatt V, Pal P, Chandra S 2005 Feasibility study of RF sputtered ZnO film for surface micromachining. Surface and Coatings Technology 198: 304–308

3. Bhatt V, Chandra S 2007a Silicon dioxide films by RF sputtering for microelectronic and MEMS applications. J. Micromech. Microeng. 17: 1066–77

4. Bhatt V, Chandra S, Kumar S, Rauthan C M S, Dixit PN 2007b Stress evaluation of RF sputtered silicon dioxide films for MEMS. Indian J. Pure and Appl. Phy. 45: 377–381

5. Bhatt V, Chandra S 2007c Planar microstructures using modified surface micromachining process. Sensor Lett. 5: 387–391

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