Influences of ultrathin amorphous buffer layers on GaAs/Si grown by metal–organic chemical vapor deposition-Reference-Cited by-同舟云学术

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Influences of ultrathin amorphous buffer layers on GaAs/Si grown by metal–organic chemical vapor deposition

Published:2018-03-12 Issue:4 Volume:124 Page:
ISSN:0947-8396
Container-title:Applied Physics A
language:en
Short-container-title:Appl. Phys. A

Author:

Hu Haiyang,Wang Jun,Cheng Zhuo,Yang Zeyuan,Yin Haiying,Fan Yibing,Ma Xing,Huang Yongqing,Ren Xiaomin

Funder

the Fund of State Key Laboratory of Information Photonics and Optical Communications

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/article/10.1007/s00339-018-1707-1/fulltext.html

Reference40 articles.

1. R. Cipro, T. Baron, M. Martin, J. Moeyaert, S. David, V. Gorbenko, F. Bassani, Y. Bogumilowicz, J.P. Barnes, N. Rochat, V. Loup, C. Vizioz, N. Allouti, N. Chauvin, X.Y. Bao, Z. Ye, J.B. Pin, E. Sanchez, Appl. Phys. Lett. 104, 262103 (2014)

2. M. Takahasi, Y. Nakata, H. Suzuki, K. Ikeda, M. Kozu, W. Hua, Y. Ohshita, J. Cryst. Growth 378, 34 (2013)

3. Y.B. Bolkhovityanov, O.P. Pchelyakov, Phys. Usp. 51, 437 (2008)

4. K.K. Linder, J. Phillips, O. Qasaimeh, X.F. Liu, S. Krishna, P. Bhattacharya, J.C. Jiang, Appl. Phys. Lett. 74, 1355 (1999)

5. M. Yamaguchi, C. Amano, J. Appl. Phys. 58, 3601 (1985)

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