Dependence of properties of hydrogenated microcrystalline and amorphous silicon films prepared by planar magnetron sputtering in inert gas-Reference-Cited by-同舟云学术

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Dependence of properties of hydrogenated microcrystalline and amorphous silicon films prepared by planar magnetron sputtering in inert gas

Published:1984-12 Issue:4 Volume:35 Page:241-247
ISSN:0721-7250
Container-title:Applied Physics A Solids and Surfaces
language:en
Short-container-title:Appl. Phys. A

Author:

Saito N.,Sannomiya H.,Yamaguchi T.,Tanaka N.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry,Physics and Astronomy (miscellaneous),General Engineering,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00617174.pdf

Reference10 articles.

1. G. Moddel, J. Blake, R.W. Collins, P. Viktrovitch, D.K. Paul, B. von Roedern, W. Paul: AIP Conf. Proc.73, 25?30 (1981)

2. T. Nagatome, S. Moribe, M. Usui, O. Omoto: Japn. J. Appl. Phys.21, Suppl. 21?2, 209?212 (1982)

3. T. Imura, K. Mogi, A. Hiraki, S. Nakashima, A. Mitsuishi: Solid State Commun.40, 161?164 (1981)

4. M. Noda, H. Shimizu, H. Kohno, H. Ishida: J. Non-Cryst. Solids59, 60, 823?826 (1983)

5. J.B. Webb: J. Appl. Phys.53, 9043?9048 (1982)

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3. Properties of a-Si:H films deposited by RF magnetron sputtering at 95°C;Applied Surface Science;2011-02

4. Amorphous and microcrystalline GeC:H films prepared by magnetron sputtering;physica status solidi (a);2009-02

5. Langmuir probe and optical emission studies in a radio frequency (rf) magnetron plasma used for the deposition of hydrogenated amorphous silicon;Surface and Coatings Technology;2008-12

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