Effect of hydrogen on the deposition rate for planar rf magnetron sputtering of hydrogenated amorphous silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.330413
Reference7 articles.
1. Properties of magnetron sputtered hydrogenated amorphous silicon
2. Discharge characteristics for magnetron sputtering of Al in Ar and Ar/O2 mixtures
3. Sputtering Process Model of Deposition Rate
4. Calculation of deposition rates in diode sputtering systems
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2. Using ammonia for reactive magnetron sputtering, a possible alternative to HiPIMS?;Applied Surface Science;2020-02
3. Investigating the role of hydrogen in silicon deposition using an energy-resolved mass spectrometer and a Langmuir probe in an Ar/H2 radio frequency magnetron discharge;Physics of Plasmas;2012-07
4. Process investigation of a-Si:H thin films prepared by DC magnetron sputtering;SPIE Proceedings;2007-11-29
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