Study of the influence of native oxide layers on atomic force microscopy imaging of semiconductor surfaces-Reference-Cited by-同舟云学术

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Study of the influence of native oxide layers on atomic force microscopy imaging of semiconductor surfaces

Published:1994-07 Issue:1 Volume:59 Page:23-27
ISSN:0721-7250
Container-title:Applied Physics A Solids and Surfaces
language:en
Short-container-title:Appl. Phys. A

Author:

Bluhm H.,Schwarz U. D.,Herrmann F.,Paufler P.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry,Physics and Astronomy (miscellaneous),General Engineering,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00348415.pdf

Reference36 articles.

1. Springer Ser. Surf. Sci.;R.J. Hamers,1992

2. M. Tanimoto, T. Furuta, Y. Kuriyama: Jpn. J. Appl. Phys. 28, L290 (1989)

3. G. Binnig, C.F. Quate, Ch. Gerber: Phys. Rev. Lett. 56, 930 (1986)

4. Springer Ser. Surf. Sci.;E. Meyer,1992

5. M. Kasu, T. Fukui: Jpn. J. Appl. Phys. 31, L864 (1992)

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