Effect of sputtering parameters on the self-cleaning properties of amorphous titanium dioxide thin films

Author:

Sabbah Hussein

Funder

King Abdulaziz City for Science and Technology

Publisher

Springer Science and Business Media LLC

Subject

Colloid and Surface Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,General Chemistry

Reference46 articles.

1. Liu, ZY, Zhang, XT, Murakami, T, Fujishima, A, “Sol–Gel SiO2/TiO2 Bilayer Films with Self-Cleaning and Antireflection Properties.” Sol. Energy Mater. Sol. Cells, 92 1434–1438 (2008)

2. Zhang, XT, Sato, O, Taguchi, M, Einaga, Y, Murakami, T, Fujishima, A, “Self-Cleaning Particle Coating with Antireflection Properties.” Chem. Mater., 17 696–700 (2005)

3. Nami, Z, Misman, O, Erbil, A, May, GS, “Effect of Growth Parameters on TiO2 Thin Films Deposited Using MOCVD.” J. Cryst. Growth, 179 522–538 (1997)

4. Yu, JC, Yua, J, Zhao, J, “Enhanced Photocatalytic Activity of Mesoporous and Ordinary TiO2 thin Films by Sulfuric Acid Treatment.” Appl. Catal. B Environ., 36 3–43 (2002)

5. Rao, KN, “Low Temperature Deposition of Nanocrystalline TiO2 Films: Enhancement of Nanocrystal Formation by Energetic Particle Bombardment.” Opt. Eng., 49 2357–2364 (2002)

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