Application of Molecular-Dynamics Simulation to Interface Stabilization in Thin-Film Devices

Author:

IWASAKI Tomio1

Affiliation:

1. Mechanical Engineering Research Laboratory, Hitachi, Ltd.

Publisher

Japan Society of Mechanical Engineers

Subject

Fluid Flow and Transfer Processes,Physical and Theoretical Chemistry,Mechanical Engineering

Reference17 articles.

1. Modeling solid-state chemistry: Interatomic potentials for multicomponent systems

2. (4) Ota, H., Migita, S., Morita, Y. and Sakai, S., HfO2 MIS Structures with a Silicon Nitride Barrier Layer, Extended Abstracts of International Workshop on Gate Insulator, (2001), pp.188-190.

3. Molecular dynamics study of adhesion strength and diffusion at interfaces between interconnect materials and underlay materials

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