Affiliation:
1. e-mail:
2. Department of Mechanical and Aerospace Engineering, University of Florida, Gainesville, FL 32611
Abstract
A magnetic field-assisted finishing (MAF) process has been developed to reduce the sidewall surface roughness of the 5–20 μm wide curvilinear pores of microelectromechanical systems micropore X-ray optics to <1 nm Rq. Although the feasibility of this process has been demonstrated on these optics, a clear understanding of the MAF process' material removal mechanisms has not been attained. In an attempt to discover these mechanisms, the MAF process is applied to a flat workpiece, allowing for direct observation and tracking of changes to distinctive surface features before and after MAF. Atomic force microscopy, field-emission scanning electron microscopy, and energy-dispersive X-ray spectroscopy are used to analyze the surface morphology and composition with respect to finishing time. These observations suggest that the MAF process modified the surface, reducing surface roughness (from 0.8 nm to 0.6 nm Rz on silicon) by removing relatively low-wavelength surface features. Moreover, the MAF process appears to modify the surface mechanically.
Subject
Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Control and Systems Engineering
Reference12 articles.
1. Ultra Light-Weight and High-Resolution X-ray Mirrors Using DRIE and X-ray LIGA Techniques for Space X-ray Telescopes;Microsyst. Technol.,2009
2. Investigation of Etched Silicon Wafers for Lobster-Eye Optics;Rev. Sci. Instrum.,1999
3. Magnetic Field-Assisted Fine Finishing;Precis. Eng.,1984
4. Study on Magnetic Abrasive Finishing;CIRP Ann.,1990
5. Magnetic Fluid Grinding—A New Technique for Finishing Advanced Ceramics;CIRP Ann.,1994
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献