A Material-Mask Overlay Strategy for Continuum Topology Optimization of Compliant Mechanisms Using Honeycomb Discretization

Author:

Saxena Anupam1

Affiliation:

1. Indian Institute of Technology, Kanpur, India, 208016

Abstract

This paper proposes novel honeycomb tessellation and material-mask overlay methods to obtain optimal single-material compliant topologies free from checkerboard and point-flexure pathologies. The presence of strain-free rotation regions in rectangular cell based discretization is identified to be a cardinal cause for appearance of such singularities. With each hexagonal cell sharing an edge with its neighboring cells, strain-free displacements are not permitted anywhere in the continuum. The new material assignment approach manipulates material within a subregion of cells as opposed to a single cell thereby reducing the number of variables making optimization efficient. Cells are allowed to get filled with only the chosen material or they can remain void. Optimal solutions obtained are free from intermediate material states and can be manufactured requiring no material interpretation and less postprocessing. Though the hexagonal cells do not allow strain-free rotations, some subregions undergoing large strain deformations can still be present within the design. The proposed procedure is illustrated using three classical examples in compliant mechanisms solved using genetic algorithm.

Publisher

ASME International

Subject

Computer Graphics and Computer-Aided Design,Computer Science Applications,Mechanical Engineering,Mechanics of Materials

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