Development of Localized Deformation in AA 2024-O

Author:

Kweon S.1,Beaudoin A. J.1,Kurath P.1,Li M.2

Affiliation:

1. Mechanical Science and Engineering, University of Illinois at Urbana-Champaign, Urbana, IL 61801

2. Alcoa Technical Center, Alcoa Center, PA 15069

Abstract

An experimental study is presented to (1) quantify the rate-sensitive mechanical response and (2) examine the localized deformation behavior under an applied temperature gradient in the alloy AA 2024. Isothermal flow stresses are obtained at temperatures from −100°C to 495°C and strain rates from 10−2/s to 10−5/s using routine compression tests and a novel cyclic test, which expedites the characterization. The material displays two distinct kinetic responses with both being amenable to localization phenomena. The lower temperature/high strain rate regime displays a rate-insensitive yield with Stage III/IV work hardening. At higher temperature/low strain rates, a rate-sensitive response with little work hardening is observed. In order to relate the material constitutive behavior to the development of localized deformation, a temperature gradient test is performed wherein temperature differences of approximately 30°C are enforced between the top and bottom surfaces of a cylindrical compression test specimen. Deformation heterogeneity developed in the two distinct regimes of material response is illustrative of warm and hot working conditions typical of industrial processes, such as rolling.

Publisher

ASME International

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3