Analysis of Unsteady Heat and Mass Transfer During the Modified Chemical Vapor Deposition Process
Affiliation:
1. Department of Mechanical Engineering, Seoul National University, Seoul 151-742, Korea
Abstract
An analysis of unsteady heat and mass transfer in the modified chemical vapor deposition has been carried out. It is found that the commonly used quasi-steady-state assumption could be used to predict the overall efficiency of particle deposition; however, the assumption would not be valid near the inlet region where tapered deposition occurs. The present unsteady calculations have been found to be capable of predicting the detailed deposition profile correctly even from the inlet region where further optimization is needed at a practical situation. The present results have also been compared with existing experimental data and were in good agreement. It is noted that previous quasi-steady calculation resulted in a significant difference in the deposition profile near the inlet region. The effects of time-varying torch speeds were also studied. The case of a linearly varying torch speed resulted in a much shorter tapered entry than the case of a constant torch speed.
Publisher
ASME International
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference27 articles.
1. Bird, R. B., Stewart, W. E., and Lightfoot, E. N., 1960, Transport Phenomena, John Wiley and Sons, New York. 2. Chase, M. W., Jr., Davies, C. A., Downey, J. R., Jr., Frurip, D. J., McDonald, R. A., and Syverund, A. N., 1986, JANAF Thermochemical Tables, American Institute of Physics, New York. 3. Cho
J.
, and ChoiM., 1995, “An Experimental Study of Heat Transfer and Particle Deposition for the Modified Chemical Vapor Deposition,” ASME JOURNAL OF HEAT TRANSFER, Vol. 117, pp. 1036–1041. 4. Choi
M.
, LinY. T., and GreifR., 1990, “Analysis of Buoyancy and Tube Rotation Relative to MCVD Process,” ASME JOURNAL OF HEAT TRANSFER, Vol. 112, pp. 1063–1069. 5. Choi
M.
, and ParkK. S., and ChoJ., 1995, “Modelling of Chemical Vapor Deposition for Optical Fiber Manufacture,” Optical and Quantum Electronics, Vol. 27, pp. 327–335.
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
|
|