First-Principles Calculations of Schottky Barrier Heights of Monolayer Metal/6H-SiC{0001} Interfaces

Author:

Tanaka Shingo1,Tamura Tomoyuki2,Okazaki Kazuyuki1,Ishibashi Shoji2,Kohyama Masanori1

Affiliation:

1. Research Institute for Ubiquitous Energy Devices, National Institute of Advanced Industrial Science and Technology (AIST)

2. Research Institute for Computational Sciences, National Institute of Advanced Industrial Science and Technology (AIST)

Publisher

Japan Institute of Metals

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference48 articles.

1. 1) W. J. Choyke and L. Patrick: Silicon Carbide—A High Temperature Semiconductor, ed. by J. R. O’Conner and J. Smiltens, (Pergamon Press, Oxford 1960).

2. 2) Silicon Carbide and Related Materials 1995, ed. by S. Nakashima, H. Matsunami, S. Yoshida and H. Harima, IOP Conf. Proc. No. 142 (Institute of Physics and Physical Society, London 1996).

3. 3) Silicon Carbide Materials: Processing, and Devices, ed. by Z. C. Feng and J. H. Zhao, Optoelectronic Properties of Semiconductors and Superlattices Vol. 20 (Taylor and Franscis Books, London 2004).

4. 4) J. R. Waldrop, R. W. Grant, Y. C. Wang and R. F. Davis: J. Appl. Phys. 72 (1992) 4757–4760.

5. 5) J. R. Waldrop and R. W. Grant: Appl. Phys. Lett. 62 (1993) 2685–2687.

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