Diffusion Coefficient of Hydrogen in Palladium Films Prepared by RF Sputtering
Author:
Affiliation:
1. Department of Iron and Steel Metallurgy, Faculty of Engineering, Kyushu University
Publisher
Japan Institute of Metals
Subject
General Engineering
Link
https://www.jstage.jst.go.jp/article/matertrans1989/31/11/31_11_954/_pdf
Reference11 articles.
1. 1) M. Fleischmann, S. Pons and M. Hawkins: J. Electroanal. Chem., 261 (1989), 301.
2. 2) S. E. Jones, E. P. Palmer, J. B. Czirr, D. L. Decker, G. L. Jensen, J. M. Thorne, S. F. Taylor and J. Rafelski: Nature, 338 (1989), 737.
3. 3) H. Hasegawa and K. Nakajima: J. Japan Inst. Metals, 41 (1977), 813.
4. 4) Y. Sakamoto and N. Tabaru: J. Japan Inst. Metals, 45 (1981), 1048.
5. 5) H. Hagi, S. Asano and N. Ohtani: Bull. Nagoya Inst. Technol., 26 (1974), 273.
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