Copper Purification by Anion-Exchange Separation in Chloride Media
Author:
Affiliation:
1. Institute for Advanced Materials Processing, Tohoku University
Publisher
Japan Institute of Metals
Subject
General Engineering
Link
https://www.jstage.jst.go.jp/article/matertrans1989/38/12/38_12_1083/_pdf
Reference16 articles.
1. 1) C. W. Park and R. W. Vook: Appl. Surface Sci., 70/71 (1993), 639.
2. 2) T. Ohmi, T. Sato, M. Otsuki, T. Shibata and T. Nitta: J. Electrochem. Soc., 138 (1991), 1089.
3. 3) T. Nitta, T. Ohmi, M. Otsuki, T. Takewaki and T. Shibata: J. Electrochem. Soc., 139 (1992), 922.
4. 4) S. P. Murarka, R. J. Gutmann, A. E. Kaloyeros and W. A. Lanford: Thin Solid Films, 236 (1993), 257.
5. 5) Y. Miyake: Bulletin Japan Inst. Metals, 31 (1992), 267.
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