Effect of Compressive Stress on Reaction-Diffusion in the Cu–Si System-Reference-Cited by-同舟云学术

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Effect of Compressive Stress on Reaction-Diffusion in the Cu–Si System

Published:1977 Issue:2 Volume:18 Page:107-112
ISSN:0021-4434
Container-title:Transactions of the Japan Institute of Metals
language:en
Short-container-title:Trans. JIM

Author:

Onishi Masami¹,Miura Hirofumi²

Affiliation:

1. Department of Metallurgy, The Kyushu Institute of Technology

2. Graduate School, The Kyushu Institute of Technology

Publisher

Japan Institute of Metals

Subject

General Engineering

Link

https://www.jstage.jst.go.jp/article/matertrans1960/18/2/18_2_107/_pdf

Reference9 articles.

1. 1) H. Miura, Y. Wakamatsu and M. Onishi: J. Japan Inst. Metals, 39 (1975), 903.

2. 2) S. K. Behera and L. C. Brown: Trans. Met. Soc. AIME, 242 (1968), 2343.

3. 3) L. C. Brown, C. C. Sanderson and C. St. John: Trans. Met. Soc. AIME, 236 (1966), 1589.

4. 4) S. Strochheim: Iron Age, 180 (1957), 136.

5. 5) F. A. Veer, B. H. Kolster and W. G. Burgers: Trans. Met. Soc. AIME, 242 (1968), 669.

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