Interposer Technology Development Which is the Most Appropriate for 2.5D Packaging

Author:

Fukuoka Yoshitaka1,Kuramochi Satoru2,Suzuki Kousuke2

Affiliation:

1. WEISTI (Worldwide Electronic Integrated Substrate Technology Inc.)

2. Next Generation MEMS Laboratory, Research & Development Center, DNP (Dai Nippon Printing Co., Ltd.)

Publisher

Japan Institute of Electronics Packaging

Subject

Electrical and Electronic Engineering

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. The Latest Technology Trends in Wet Processes for 2.xD Package;Journal of The Japan Institute of Electronics Packaging;2023-01-01

2. Copper Plating on Through Glass Via(TGV)Using Both High-speed Sputtering Process and Wet Process;Journal of The Surface Finishing Society of Japan;2021-09-01

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