Effect of deposition conditions and buffer layers on amorphous or polytype phase formation in Al<sub>2</sub>O<sub>3</sub> thin films by chemical vapor deposition using tri-methyl aluminum-Reference-Cited by-同舟云学术

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Effect of deposition conditions and buffer layers on amorphous or polytype phase formation in Al₂O₃ thin films by chemical vapor deposition using tri-methyl aluminum

Published:2019-06-01 Issue:6 Volume:127 Page:443-450
ISSN:1348-6535
Container-title:Journal of the Ceramic Society of Japan
language:en
Short-container-title:J. Ceram. Soc. Japan

Author:

LIN Chunfu¹,TANAKA Takashi¹,NISHIYAMA Akio¹,SHIOTA Tadashi¹,SAKURAI Osamu¹,WAKIYA Naoki²,SHINOZAKI Kazuo¹,YASUDA Kouichi¹

Affiliation:

1. School of Materials and Chemical Technology, Tokyo Institute of Technology

2. Department of Electronics and Materials Science, Shizuoka University

Publisher

Ceramic Society of Japan

Subject

Materials Chemistry,Condensed Matter Physics,General Chemistry,Ceramics and Composites

Link

https://www.jstage.jst.go.jp/article/jcersj2/127/6/127_18192/_pdf

Reference24 articles.

1. 1) I. Levin and D. Brandon, J. Am. Ceram. Soc., 81, 1995–2012 (1998).

2. 2) R. J. Yang, P. C. Yu, C. C. Chen and F. S. Yen, Cryst. Growth Des., 9, 1692–1697 (2009).

3. 3) R. N. Das, A. Bandyopadhyay and S. Bose, J. Am. Ceram. Soc., 84, 2421–2423 (2001).

4. 4) S. Vuorinen and J. Skogsmo, Thin Solid Films, 193/194, 536–546 (1990).

5. 5) S. Ruppi, Int. J. Refract. Met. H., 23, 306–316 (2005).

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1. Low-Temperature Atomic Layer Deposition of α-Al2O3 Thin Films;Crystal Growth & Design;2021-06-14

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