Properties and Structure of Rf-Sputtered Amorphous Films in the AlPO4-Al2O3 System
Author:
Affiliation:
1. Department of Chemistry, College of Liberal Arts & Sciences, Kyoto University
2. Department of Industrial Chemistry, Faculty of Engineering, Kyoto University
Publisher
Ceramic Society of Japan
Subject
Materials Chemistry,Condensed Matter Physics,General Chemistry,Ceramics and Composites
Link
http://www.jstage.jst.go.jp/article/jcersj1988/97/1123/97_1123_279/_pdf
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Solution-Processed Aluminum Oxide Phosphate Thin-Film Dielectrics;Chemistry of Materials;2007-07-04
2. Network structure of r.f.-sputtered amorphous AlPO4MgO and AlPO4CaO films;Thin Solid Films;1993-05
3. Properties and Network Constitution of rf-Sputtered Amorphous Films in the System Silicon Dioxide-Aluminum Orthophosphate;Journal of the American Ceramic Society;1992-12
4. Preparation and Physical Properties of Radiofrequency-Sputtered Amorphous Films in the System AlPO4-TiO2;Journal of the American Ceramic Society;1992-09
5. Special Articles on Organic and Inorganic Optical Materials. Preparation and Optical Properties of Er3+-Doped Amorphous Alumina Films by Magnetron Sputtering.;NIPPON KAGAKU KAISHI;1992
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