Evaluation of titanium nitride/titanium aluminum nitride thin film coating, plasma nitriding on AISI 304 stainless steel using the plasma-assisted physical vapor deposition process, and thermal stress investigated through finite-element analysis

Author:

Aslam Mohd1ORCID,Chandan Guddakesh Kumar1ORCID,Kanchan Brajesh Kumar12ORCID

Affiliation:

1. Department of Mechanical Engineering, National Institute of Technology, Silchar, India

2. Department of Production Engineering, PSG college of Technology, Coimbatore, India

Abstract

In the present paper, plasma-assisted physical vapor depositions (PAPVDs) have been used to extract the TiN and titanium aluminum nitride (TiAlN). Further, plasma nitriding (PN) has been used prior to thin-film deposition of TiN on AISI 304 stainless steel material using intentional biasing (in the coating). PAPVD is integrated to investigate the thermal resistant effect coating of AISI 304 stainless steel by TiN coating using finite-element analysis. The morphology of elements on the coating was studied by field emission scanning electron microscopy, X-ray diffraction (XRD), and energy-dispersive X-ray spectroscopy. From XRD analysis, it has been observed that at the coated zone Ti, TiN was found on the AISI 3O4 stainless steel. The results in microhardness through the Vickers microhardness tester have been measured up to 350 Hv for the base sample at a 10 g load. Moreover, TiN/(PN + TiN) coated samples were measured with an average microhardness of 2220, 963, and 720 Hv for the nitride sample. In addition to this, the microhardness of TiAlN was found up to 1890 and 2400 Hv for different samples. The thickness of the film is around 1.4279 µm (TiN) and 1.888 µm (TiAlN) in 1 h of deposition.

Publisher

SAGE Publications

Subject

Industrial and Manufacturing Engineering,Mechanical Engineering

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