1. 1) Y. Shibazaki, H. Kohno, M. Hamatani: An innovative platform for high-throughput high-accuracy lithography using a single wafer stage, SPIE, 7274, (2009) 1-12.
2. 2) ASML, P2007-318119A.
3. 3) Nikon, WO2008/026742.
4. 4) Towards Ultimate Optical Lithography with NXT: 1950i Dual Stage Immersion Platform 2010 SPIE Vol76401N, (2010)1-12.
5. 5) M. Niiya: Technology of Self Calibrated 2D Encoder Scale, J. Japan Soc. Precis. Eng., 82, 9, (2016) 788-791.