Author:
Shima A.,Jinbo T.,Ushio J.,Oh J.-H.,Ono K.,Oshima M.,Natsuaki N.
Cited by
2 articles.
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1. Transient enhanced diffusion of boron in Si;Journal of Applied Physics;2002-06
2. Backside sputter depth profiling of phosphorus diffusion from a polysilicon source;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2002