Deposition and Characterization of Ammonia-free PECVD Silicon Nitride-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Deposition and Characterization of Ammonia-free PECVD Silicon Nitride

Published:2023-04-25 Issue: Volume: Page:
ISSN:
Container-title:2023 24th International Vacuum Electronics Conference (IVEC)
language:
Short-container-title:

Author:

Li Yue¹,Luo Yi²,Fang Zhizeng²,Xu Dengqin¹,Li Qi¹,Zhang Xing³,Wang Yi³,Han Dedong³

Affiliation:

1. school of Integrated Circuit, Peking University,Beijing,China

2. School of Software and Microelectronics, Peking University,Beijing,China

3. School of Integrated Circuit Peking University,Beijing Advanced Innovation Center for Integrated Circuits,Bejing,China

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10156868/10156872/10157925.pdf?arnumber=10157925

Reference5 articles.

1. Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF 4 /H 2 plasma at different substrate temperatures

2. Material and optical properties of low-temperature NH3-free PECVD SiNxlayers for photonic applications

3. Silicon lifetime enhancement by SiNx:H anti-reflective coating deposed by PECVD using SiH4 and N2 reactive gas

4. Review of Recent Progress on Silicon Nitride-Based Photonic Integrated Circuits

5. The preparation, characterization and applications of silicon nitride thin films

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3