A Fast Imaging Model of Plasmonic Lithography for Line/space Patterns Based on Parameter Sweep
Author:
Affiliation:
1. EDA Center Institute of Microelectronics,Chinese Academy of Sciences,Beijing,China
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx8/10616249/10617469/10617481.pdf?arnumber=10617481
Reference19 articles.
1. Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review
2. Achieving pattern uniformity in plasmonic lithography by spatial frequency selection
3. Nanolithography Using High Transmission Nanoscale Bowtie Apertures
4. Recent Advances in Plasmonic Nanolithography
5. Fabrication of sub-100nm Patterns using Near-field Mask Lithography with Ultra-thin Resist Process
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