Competitive and cost effective high-k based 28nm CMOS technology for low power applications

Author:

Arnaud F.,Thean A.,Eller M.,Lipinski M.,Teh Y.W.,Ostermayr M.,Kang K.,Kim N.S.,Ohuchi K.,Han J-P.,Nair D.R.,Lian J.,Uchimura S.,Kohler S.,Miyaki S.,Ferreira P.,Park J-H.,Hamaguchi M.,Miyashita K.,Augur R.,Zhang Q.,Strahrenberg K.,ElGhouli S.,Bonnouvrier J.,Matsuoka F.,Lindsay R.,Sudijono J.,Johnson F.S.,Ku J.H.,Sekine M.,Steegen A.,Sampson R.

Publisher

IEEE

Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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3. PLANAR;Proceedings of the ACM International Conference on Supercomputing;2021-06-03

4. Total ionizing dose effects of 60Co γ-rays radiation on HfxZr1−xO2 ferroelectric thin film capacitors;Journal of Materials Science: Materials in Electronics;2019-12-21

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