Fully Optimized Cu based process with dedicated cavity etch for 1.75μm and 1.45μm pixel pitch CMOS Image Sensors-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Fully Optimized Cu based process with dedicated cavity etch for 1.75μm and 1.45μm pixel pitch CMOS Image Sensors

Published:2006 Issue: Volume: Page:
ISSN:
Container-title:2006 International Electron Devices Meeting
language:
Short-container-title:

Author:

Cohen M.,Roy F.,Herault D.,Cazaux Y.,Gandolfi A.,Reynard Jp.,Cowache C.,Bruno E.,Girault T.,Vaillant J.,Barbier F.,Sanchez Y.,Hotellier N.,LeBorgne O.,Augier C.,Inard A.,Jagueneau T.,Zinck C.,Michailos J.,Mazaleyrat E.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/4154162/4139311/04154411.pdf?arnumber=4154411

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Modeling for Single-Photon Avalanche Diodes: State-of-the-Art and Research Challenges;Sensors;2023-03-24

2. 1T semi-floating gate image sensor with enhanced quantum efficiency and high response speed;Japanese Journal of Applied Physics;2020-02-28

3. A comprehensive study of the impact of dislocation loops on leakage currents in Si shallow junction devices;Journal of Applied Physics;2015-11-14

4. Total dose radiation effects of hybrid bulk/SOI CMOS active pixel with buried channel SOI source follower;Microelectronics Journal;2014-04

5. New mechanism of plasma induced damage on CMOS image sensor: Analysis and process optimization;Solid-State Electronics;2011-11

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP