XtreMOS : The First Integrated Power Transistor Breaking the Silicon Limit

Author:

Moens P.,Bauwens F.,Baele J.,Vershinin K.,De Backer E.,Sankara Narayanan E.M.,Tack M.

Publisher

IEEE

Cited by 20 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. An Ultra-Fast and Precise Automatic Design Framework for Predicting and Constructing High-Performance Shallow-Trench-Isolation LDMOS Device;2024-07-31

2. Influence of Structure Parameters on the RoN, sp of Quasi- Vertical Power DMOS Compatible with 0.18μm BCD Process;2024 36th International Symposium on Power Semiconductor Devices and ICs (ISPSD);2024-06-02

3. Strain Engineering in Si Split-Gate Trench Power MOSFETs by Partial Oxidation of Polysilicon Electrodes;IEEE Transactions on Electron Devices;2023-03

4. BCD Process Technologies;Springer Handbook of Semiconductor Devices;2022-11-11

5. Charge Balance and UIS Robustness of Trench Field Plate Power MOSFETs;2022 IEEE 34th International Symposium on Power Semiconductor Devices and ICs (ISPSD);2022-05-22

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